Advanced Ceramic Structures and Materials for High-Reliability Millimeter-Wave Applications

2011 ◽  
Vol 2011 (CICMT) ◽  
pp. 000182-000185
Author(s):  
Iris Labadie
Keyword(s):  
Millimeter Wave ◽  
Semiconductor Device ◽  
High Reliability ◽  
Electrical Performance ◽  
Low Loss ◽  
Passive Components ◽  
Package Design ◽  
The Past ◽  
Performance Requirements ◽  
Circuit Components

Semiconductor device speeds and circuit operating frequencies have increased substantially over the past decade. Although millimeter-wave technology has been around for over 100 years, it is only within the past 5–10 years that increased demand for millimeter-wave commercial products and services has driven the development of new electronic package designs, low-loss materials, and the transformation of passive components to integrated and smaller geometries. High-reliability applications have employed millimeter-waves for several decades, but typically utilized heavy materials and distributed architectures. The transition of high-reliability millimeter-wave applications to new materials such as low-temperature co-fired ceramics requires innovative package designs to achieve comparable or better electrical performance in a much smaller form factor. Ceramic packaging technology continues to meet or exceed the performance requirements of high-reliability millimeter-wave applications with a broadened portfolio of material sets and innovative internal circuit components such as filter banks, antennas, and waveguides. Today's ceramic package design techniques and materials for applications within current and future high-reliability millimeter-wave markets will be discussed.

Embedded Actives and Its Industry Effects

2011 ◽  
Vol 2011 (1) ◽  
pp. 000382-000387
Author(s):  
Ray Fillion
Keyword(s):  
Semiconductor Device ◽  
Electrical Performance ◽  
Circuit Boards ◽  
Microelectronics Packaging ◽  
Ceramic Substrates ◽  
The Past ◽  
History Of ◽  
Microelectronics Industry ◽  
Component Assembly ◽  
Electrical Reliability

Over the 60 plus year history of microelectronics packaging, electronic devices have been mounted onto an interconnect structure to form a microelectronics circuit. The devices could be bare chips, CSPs or packaged components such as SMT or thru-hole carriers. The interconnect structures could be circuit boards, ceramic substrates or flex circuits. This methodology has enabled a clear divide between the fabrication, assembly and test of the semiconductor device, the fabrication and test of the interconnect structure and the assembly and test of the component/substrate assembly. Over the past decade a new packaging methodology, embedded actives (chips), has been developed that changes all of these industry norms. In an embedded actives packaging approach, one or more bare or chip scale semiconductor devices are embedded within the interconnect structure. Although these approaches have significant electrical performance, size and cost benefits, the normal barriers between chip packaging, substrate fabrication and component assembly are removed. The interconnect structure is not completed prior to component embedding and the embedded component cannot be tested at packaged part level without the interconnect structure. This complicates electrical testing and makes it virtually impossible to differentiate between a defective component, a defective interconnect or a defective component to substrate contact. This paper will look at the history of embedded active developments and go into the various processes and structures being used. It will cover their electrical, reliability and size advantages and will address the revolutionary changes that the microelectronics industry must make to effectively utilize these technologies.

scholarly journals Wideband Waveguide-to-Microstrip Transition for mm-Wave Applications

2019 ◽  
Vol 22 (5) ◽  
pp. 17-32
Author(s):  
Andrey V. Mozharovskiy ◽  
Oleg V. Soykin ◽  
Aleksey A. Artemenko ◽  
Roman O. Maslennikov ◽  
Irina B. Vendik
Keyword(s):  
Experimental Investigation ◽  
Millimeter Wave ◽  
Insertion Loss ◽  
Communication Systems ◽  
60 Ghz ◽  
Feeding System ◽  
Frequency Range ◽  
Low Loss ◽  
Passive Components ◽  
Full Wave

Introduction. Increased data rate in modern communication systems can be achieved by raising the operational frequency to millimeter wave range where wide transmission bands are available. In millimeter wave communication systems, the passive components of the antenna feeding system, which are based on hollow metal waveguides, and active elements of the radiofrequency circuit, which have an interface constructed on planar printed circuit boards (PCB) are interconnected using waveguide-to-microstrip transition.Aim. To design and investigate a high-performance wideband and low loss waveguide-to-microstrip transition dedicated to the 60 GHz frequency range applications that can provide effective transmission of signals between the active components of the radiofrequency circuit and the passive components of the antenna feeding systemMaterials and methods. Full-wave electromagnetic simulations in the CST Microwave Studio software were used to estimate the impact of the substrate material and metal foil on the characteristics of printed structures and to calculate the waveguide-to-microstrip transition characteristics. The results were confirmed via experimental investigation of fabricated wideband transition samples using a vector network analyzer Results. The probe-type transition consist of a PCB fixed between a standard WR-15 waveguide and a back-short with a simple structure and the same cross-section. The proposed transition also includes two through-holes on the PCB in the center of the transition area on either side of the probe. A significant part of the lossy PCB dielectric is removed from that area, thus providing wideband and low-loss performance of the transition without any additional matching elements. The design of the transition was adapted for implementation on the PCBs made of two popular dielectric materials RO4350B and RT/Duroid 5880. The results of full-wave simulation and experimental investigation of the designed waveguide to microstrip transition are presented. The transmission bandwidth for reflection coefficient S11 < –10 dB is in excess of 50…70 GHz. The measured insertion loss for a single transition is 0.4 and 0.7 dB relatively for transitions based on RO4350B and RT/Duroid 5880.Conclusion. The proposed method of insertion loss reduction in the waveguide-to-microstrip transition provides effective operation due to reduction of the dielectric substrate portion in the transition region for various high-frequency PCB materials. The designed waveguide-to -microstrip transition can be considered as an effective solution for interconnection between the waveguide and microstrip elements of the various millimeter-wave devices dedicated for the 60 GHz frequency range applications.

scholarly journals Early Fault-Analysis Using In-Line Raman Spectroscopy Metrology

2021 ◽  
Author(s):  
D. Fishmana ◽  
L. Neemana ◽  
N. Meira ◽  
Y. Orena ◽  
G. Baraka ◽  
...  
Keyword(s):  
Semiconductor Device ◽  
High Reliability ◽  
High Sensitivity ◽  
Fault Analysis ◽  
Electrical Performance ◽  
Data Retention ◽  
Device Reliability ◽  
Scale Down ◽  
The Relationship ◽  
Advanced System

Abstract As semiconductor device dimensions scale down, process variation impact on reliability becomes increasingly severe. This trend stems from the high-reliability requirements typical for advanced system applications, the narrowing process margins and the high sensitivity of devices to material and dimensional variations. At the process level, many deviations from nominal conditions can degrade the devices' reliability. Examples are induced charge traps in the various types of memory cells, electrical performance inhibitors due to lattice defects or poor stress management and poor data retention due to contamination by killer elements. We claim that monitoring and correcting deviations throughout the fabrication process provides an effective approach for preventing reliability failures. By restricting deviations below specific threshold levels and screening out reliability and End Of line (EOL) related parameters, eventual device reliability can be safeguarded. This paper addresses the relationship between various process parameters and reliability, and reviews the enablers of preventive, early-detection inline metrology in the fab.

RF System in Packages (SiP) using Integrated Passive Devices

2011 ◽  
Vol 2011 (DPC) ◽  
pp. 001977-001995
Author(s):  
Kai Liu ◽  
YongTaek Lee ◽  
HyunTai Kim ◽  
Gwang Kim ◽  
Billy Ahn
Keyword(s):  
High Performance ◽  
Substrate Material ◽  
Electrical Performance ◽  
Low Loss ◽  
Passive Components ◽  
Cycle Times ◽  
Rf Power Amplifier ◽  
Small Form Factor ◽  
Rf Packaging ◽  
Tolerance Control

Passive components are indispensible parts used in System in Packages (SiP) for various functions, such as decoupling, biasing, resonating, filtering, matching, transforming, etc. Making passive components embedded inside laminate substrates is limited on passive density. SMD solutions are by far the most popular approaches in the industry, and may still be dominant for some times. As high integration and high performance have become a trend in the packaging solutions, integrated passive device (IPD) technology shows some unique features, which helps to achieve these goals, especially for RF packages. In the IPD process, low-loss substrate material is used, and therefore high-Q inductors can be built. In addition, thin-film IPD process has finer pitch feature and better tolerance control than other commonly available ones, such as PCB and LTCC technologies, which may yield very repeatable electrical performance, and provide packages of high integration. Several cases of study will be presented and here are some highlights of them. In case one, a most straightforward SiP approach is presented using QFN package, where several dies (including IPD dies) are implemented side-by-side. This approach may give fast developing cycle times. But importantly, wire-bonding models have big impact on performance from RF packaging, and should be obtained accurately for designs. Another case of study is a stack-die package, where inter-die coupling/cross talk could be a big issue as far as electrical performance is concerned. Placement of some critical parts, such as coils in IPD and in VCO, should be investigated very carefully in design phases. This leads to a concept of ‘IC/IPD/package’ co-design. Finally, a hybrid SiP package solution, where an IPD die is embedded in a mold compound along side with a RF power amplifier die, is presented. This approach (so called ‘eWLB’ packaging), results in the shortest interconnection between dies to dies and dies to balls. With the benefit from both the IPD process and the eWLB process (where low-loss mold materials are used), this approach may lead to high electrical performance and small form-factor at the same time.

Metal Microstructures in Advanced CMOS Devices

1996 ◽  
Vol 54 ◽  
pp. 358-359
Author(s):  
L. M. Gignac ◽  
K. P. Rodbell
Keyword(s):  
Grain Boundaries ◽  
Semiconductor Device ◽  
Chemical Vapor ◽  
Microstructural Characterization ◽  
Metal Films ◽  
Thin Metal ◽  
Electrical Performance ◽  
Thin Metal Films ◽  
Chemical Vapor Deposited ◽  
Boundary Properties

As advanced semiconductor device features shrink, grain boundaries and interfaces become increasingly more important to the properties of thin metal films. With film thicknesses decreasing to the range of 10 nm and the corresponding features also decreasing to sub-micrometer sizes, interface and grain boundary properties become dominant. In this regime the details of the surfaces and grain boundaries dictate the interactions between film layers and the subsequent electrical properties. Therefore it is necessary to accurately characterize these materials on the proper length scale in order to first understand and then to improve the device effectiveness. In this talk we will examine the importance of microstructural characterization of thin metal films used in semiconductor devices and show how microstructure can influence the electrical performance. Specifically, we will review Co and Ti silicides for silicon contact and gate conductor applications, Ti/TiN liner films used for adhesion and diffusion barriers in chemical vapor deposited (CVD) tungsten vertical wiring (vias) and Ti/AlCu/Ti-TiN films used as planar interconnect metal lines.

Microhardness Testing on Via Fill Material for Via In Pad Technology

2003 ◽  
Author(s):  
Norman J. Armendariz ◽  
Carolyn McCormick
Keyword(s):  
Printed Circuit Board ◽  
Failure Modes ◽  
Strong Dependence ◽  
Circuit Board ◽  
Electrical Performance ◽  
Gravimetric Analysis ◽  
Passive Components ◽  
Root Cause ◽  
Fill Material ◽  
Signal Routing

Abstract Via in pad PCB (Printed Circuit board) technology for passive components such as chip capacitors and resistors, provides the potential for improved signal routing density and reduced PCB area. Because of these improvements there is the potential for PCB cost reduction as well as gains in electrical performance through reduced impedance and inductance. However, not long after the implementation, double digit unit failures for solder joint electrical opens due to capacitor “tombstoning” began to occur. Failure modes included via fill material (solder mask) protrusion from the via as well as “out gassing” and related “tombstoning.” This failure analysis involved investigating a strong dependence on PCB supplier and, less obviously, manufacturing site. Other factors evaluated included via fill material, drill size, via fill thermal history and via fill amount or fill percent. The factor most implicated was incomplete cure of the via fill material. Previous thermal gravimetric analysis methods to determine level of polymerization or cure did not provide an ability to measure and demonstrate via fill cure level in small selected areas or its link to the failures. As a result, there was a metrology approach developed to establish this link and root-cause the failures in the field, which was based on microhardness techniques and noncontact via fill measuring metrologies.

scholarly journals A RF Redundant TSV Interconnection for High Resistance Si Interposer

Micromachines ◽  
2021 ◽  
Vol 12 (2) ◽  
pp. 169
Author(s):  
Mengcheng Wang ◽  
Shenglin Ma ◽  
Yufeng Jin ◽  
Wei Wang ◽  
Jing Chen ◽  
...  
Keyword(s):  
Millimeter Wave ◽  
High Frequency ◽  
High Performance ◽  
Rapid Development ◽  
Coplanar Waveguide ◽  
Equivalent Circuit Model ◽  
High Resistivity ◽  
Performance Requirements ◽  
Wave Radar ◽  
Interconnect Design

Through Silicon Via (TSV) technology is capable meeting effective, compact, high density, high integration, and high-performance requirements. In high-frequency applications, with the rapid development of 5G and millimeter-wave radar, the TSV interposer will become a competitive choice for radio frequency system-in-package (RF SIP) substrates. This paper presents a redundant TSV interconnect design for high resistivity Si interposers for millimeter-wave applications. To verify its feasibility, a set of test structures capable of working at millimeter waves are designed, which are composed of three pieces of CPW (coplanar waveguide) lines connected by single TSV, dual redundant TSV, and quad redundant TSV interconnects. First, HFSS software is used for modeling and simulation, then, a modified equivalent circuit model is established to analysis the effect of the redundant TSVs on the high-frequency transmission performance to solidify the HFSS based simulation. At the same time, a failure simulation was carried out and results prove that redundant TSV can still work normally at 44 GHz frequency when failure occurs. Using the developed TSV process, the sample is then fabricated and tested. Using L-2L de-embedding method to extract S-parameters of the TSV interconnection. The insertion loss of dual and quad redundant TSVs are 0.19 dB and 0.46 dB at 40 GHz, respectively.

Irradiation Induced Changes in Semiconducting Thin Films

2013 ◽  
Vol 341 ◽  
pp. 181-210 ◽  
Author(s):  
S.K. Tripathi
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Heavy Ions ◽  
Semiconductor Device ◽  
High Energy ◽  
Device Fabrication ◽  
Electrical Performance ◽  
Radiation Environment ◽  
Extended Defects ◽  
Semiconducting Thin Films

High-energy electron, proton, neutron, photon and ion irradiation of semiconductor diodes and solar cells has long been a topic of considerable interest in the field of semiconductor device fabrication. The inevitable damage production during the process of irradiation is used to study and engineer the defects in semiconductors. In a strong radiation environment in space, the electrical performance of solar cells is degraded due to direct exposure to energetically charged particles. A considerable amount of work has been reported on the study of radiation damage in various solar cell materials and devices in the recent past. In most cases, high-energy heavy ions damage the material by producing a large amount of extended defects, but high-energy light ions are suitable for producing and modifying the intrinsic point defects. The defects can play a variety of electronically active roles that affect the electrical, structural and optical properties of a semiconductor. This review article aims to present an overview of the advancement of research in the modification of glassy semiconducting thin films using different types of radiations (light, proton and swift heavy ions). The work which has been done in our laboratory related to irradiation induced effects in semiconducting thin films will also be compared with the existing literature.

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