Multi-Site Full Thickness Backside Focused Ion Beam (FIB) Editing for eDRAM Array Address Descramble Verification

Author(s):  
Steven B. Herschbein ◽  
Carmelo F. Scrudato ◽  
George K. Worth ◽  
Edward S. Hermann

Abstract Focused Ion Beam (FIB) modification for chip repair, layout verification, and internal signal probing has become an integral part of the process for bringing advanced products to market. As devices become more complex, with more levels of dense, thick upper power planes and tighter lower point-to-point wiring and device geometries, primary FIB access through the backside of the chip has become the only viable approach. And the pervasive switch to flip-chip solder bump mounting of chips to modules and chip to chip stacked die has made the backside editing approach ever more sensible by placing the unobstructed backside of the die within easy reach. Sample preparation for backside edit, however, has become a growing problem. Mechanical thinning of the silicon to speed trenching time can be problematic on highly stressed chips as there is a high risk of silicon cracking. Plus there are situations in which die strength must be preserved to enable the transfer of an edited die to a new substrate. While single point full thickness silicon editing has been demonstrated, the need to make multiple trenches for repetitive edits can be extremely time consuming when using conventional FIB bulk removal recipes. A single logic error often gets repeated in each core of a multi-core chip, and may need to be fixed at each location. Verification of existing SRAM and the introduction of embedded DRAM (eDRAM) for large blocks of L3 cache on high end microprocessors meant that the FIB lab would be called upon to provide layout checking services on a number of designs. Clearly, a better method for rapid mass silicon removal needed to be developed to keep multi-point backside editing viable. Through an extensive set of experiments we were able to develop a process that can sustain a removal rate of 10 million cubic microns of silicon per minute, enabling full thickness trenches in as little as 25 minutes. As will be shown, this preparation technique was successfully used to ensure the bit map descramble accuracy of multiple eDRAM array blocks in several cores, and to help evaluate test coverage.

Author(s):  
K. Doong ◽  
J.-M. Fu ◽  
Y.-C. Huang

Abstract The specimen preparation technique using focused ion beam (FIB) to generate cross-sectional transmission electron microscopy (XTEM) samples of chemical vapor deposition (CVD) of Tungsten-plug (W-plug) and Tungsten Silicides (WSix) was studied. Using the combination method including two axes tilting[l], gas enhanced focused ion beam milling[2] and sacrificial metal coating on both sides of electron transmission membrane[3], it was possible to prepare a sample with minimal thickness (less than 1000 A) to get high spatial resolution in TEM observation. Based on this novel thinning technique, some applications such as XTEM observation of W-plug with different aspect ratio (I - 6), and the grain structure of CVD W-plug and CVD WSix were done. Also the problems and artifacts of XTEM sample preparation of high Z-factor material such as CVD W-plug and CVD WSix were given and the ways to avoid or minimize them were suggested.


Author(s):  
Steven B. Herschbein ◽  
Hyoung H. Kang ◽  
Scott L. Jansen ◽  
Andrew S. Dalton

Abstract Test engineers and failure analyst familiar with random access memory arrays have probably encountered the frustration of dealing with address descrambling. The resulting nonsequential internal bit cell counting scheme often means that the location of the failing cell under investigation is nowhere near where it is expected to be. A logical to physical algorithm for decoding the standard library block might have been provided with the design, but is it still correct now that the array has been halved and inverted to fit the available space in a new processor chip? Off-line labs have traditionally been tasked with array layout verification. In the past, hard and soft failures could be induced on the frontside of finished product, then bitmapped to see if the sites were in agreement. As density tightened, flip-chip FIB techniques to induce a pattern of hard fails on packaged devices came into practice. While the backside FIB edit method is effective, it is complex and expensive. The installation of an in-line Dual Beam FIB created new opportunities to move FA tasks out of the lab and into the FAB. Using a new edit procedure, selected wafers have an extensive pattern of defects 'written' directly into the memory array at an early process level. Bitmapping of the RAM blocks upon wafer completion is then used to verify correlation between the physical damaged cells and the logical sites called out in the test results. This early feedback in-line methodology has worked so well that it has almost entirely displaced the complex laboratory procedure of backside FIB memory array descramble verification.


Author(s):  
Jim B. Colvin

Abstract A new method of preparation will be shown which allows traditional fixturing such as test heads and probe stations to be utilized in a normal test mode. No inverted boards cabled to a tester are needed since the die remains in its original package and is polished and rebonded to a new package carrier with the polished side facing upward. A simple pin reassignment is all that is needed to correct the reverse wire sequence after wire to wire bonding or wire to frame bonding in the new package frame. The resulting orientation eliminates many of the problems of backside microscopy since the resulting package orientation is now frontside. The low profile as a result of this technique allows short working distance objectives such as immersion lenses to be used across the die surface. Test equipment can be used in conjunction with analytical tools such as the emission microscope or focused ion beam due to the upright orientation of the polished backside silicon. The relationship between silicon thickness and transmission for various wavelengths of light will be shown. This preparation technique is applicable to advanced packaging methods and has the potential to become part of future assembly processes.


Microscopy ◽  
2020 ◽  
Author(s):  
Kazuo Yamamoto ◽  
Satoshi Anada ◽  
Takeshi Sato ◽  
Noriyuki Yoshimoto ◽  
Tsukasa Hirayama

Abstract Phase-shifting electron holography (PS-EH) is an interference transmission electron microscopy technique that accurately visualizes potential distributions in functional materials, such as semiconductors. In this paper, we briefly introduce the features of the PS-EH that overcome some of the issues facing the conventional EH based on Fourier transformation. Then, we present a high-precision PS-EH technique with multiple electron biprisms and a sample preparation technique using a cryo-focused-ion-beam, which are important techniques for the accurate phase measurement of semiconductors. We present several applications of PS-EH to demonstrate the potential in organic and inorganic semiconductors and then discuss the differences by comparing them with previous reports on the conventional EH. We show that in situ biasing PS-EH was able to observe not only electric potential distribution but also electric field and charge density at a GaAs p-n junction and clarify how local band structures, depletion layer widths, and space charges changed depending on the biasing conditions. Moreover, the PS-EH clearly visualized the local potential distributions of two-dimensional electron gas (2DEG) layers formed at AlGaN/GaN interfaces with different Al compositions. We also report the results of our PS-EH application for organic electroluminescence (OEL) multilayers and point out the significant potential changes in the layers. The proposed PS-EH enables more precise phase measurement compared to the conventional EH, and our findings introduced in this paper will contribute to the future research and development of high-performance semiconductor materials and devices.


Author(s):  
C.S. Bonifacio ◽  
P. Nowakowski ◽  
R. Li ◽  
M.L. Ray ◽  
P.E. Fischione ◽  
...  

Abstract Fast and accurate examination from the bulk to the specific area of the defect in advanced semiconductor devices is critical in failure analysis. This work presents the use of Ar ion milling methods in combination with Ga focused ion beam (FIB) milling as a cutting-edge sample preparation technique from the bulk to specific areas by FIB lift-out without sample-preparation-induced artifacts. The result is an accurately delayered sample from which electron-transparent TEM specimens of less than 15 nm are obtained.


2017 ◽  
Vol 23 (3) ◽  
pp. 484-490 ◽  
Author(s):  
Andrey Denisyuk ◽  
Tomáš Hrnčíř ◽  
Jozef Vincenc Oboňa ◽  
Sharang ◽  
Martin Petrenec ◽  
...  

AbstractWe report on the mitigation of curtaining artifacts during transmission electron microscopy (TEM) lamella preparation by means of a modified ion beam milling approach, which involves altering the incident angle of the Ga ions by rocking of the sample on a special stage. We applied this technique to TEM sample preparation of a state-of-the-art integrated circuit based on a 14-nm technology node. Site-specific lamellae with a thickness <15 nm were prepared by top-down Ga focused ion beam polishing through upper metal contacts. The lamellae were analyzed by means of high-resolution TEM, which showed a clear transistor structure and confirmed minimal curtaining artifacts. The results are compared with a standard inverted thinning preparation technique.


Materials ◽  
2020 ◽  
Vol 13 (12) ◽  
pp. 2871
Author(s):  
Qiuling Wen ◽  
Xinyu Wei ◽  
Feng Jiang ◽  
Jing Lu ◽  
Xipeng Xu

Sapphire substrates with different crystal orientations are widely used in optoelectronic applications. In this work, focused ion beam (FIB) milling of single-crystal sapphire with A-, C-, and M-orientations was performed. The material removal rate (MRR) and surface roughness (Sa) of sapphire with the three crystal orientations after FIB etching were derived. The experimental results show that: The MRR of A-plane sapphire is slightly higher than that of C-plane and M-plane sapphires; the Sa of A-plane sapphire after FIB treatment is the smallest among the three different crystal orientations. These results imply that A-plane sapphire allows easier material removal during FIB milling compared with C-plane and M-plane sapphires. Moreover, the surface quality of A-plane sapphire after FIB milling is better than that of C-plane and M-plane sapphires. The theoretical calculation results show that the removal energy of aluminum ions and oxygen ions per square nanometer on the outermost surface of A-plane sapphire is the smallest. This also implies that material is more easily removed from the surface of A-plane sapphire than the surface of C-plane and M-plane sapphires by FIB milling. In addition, it is also found that higher MRR leads to lower Sa and better surface quality of sapphire for FIB etching.


1992 ◽  
Vol 279 ◽  
Author(s):  
R. R. Kola ◽  
G. K. Celler ◽  
L R. Harriott

ABSTRACTTungsten is emerging as the absorber material of choice for x-ray masks due to recent advances in the deposition of low stress films. For a practical technology, the masks must be free from defects. These defects may be in the form of excess or missing absorber. Finely focused ion beams have been used for defect repair on x-ray masks, both for removal of excess absorber material by physical sputtering and for addition of absorber material by ion-induced deposition. The eifect of ion channeling in polycrystalline tungsten films is spatially nonuniform material removal during sputtering. Different grains will have significantly different sputtering yields, depending on their orientation with respect to the direction of the ion beam. The repaired features then suffer from roughness on the bottoms and sidewalls of the sputter craters. We have investigated the use of XeF2 assisted sputtering with a 20 keV Ga+ focused ion beam to reduce this roughness. The chemical etching component of the material removal lessens the directional dependence and therefore the roughness during defect repair. It was also found that chromium etch rate was reduced in the presence of XeF2 gas while the etch rate of W was enhanced so that the removal rate of Cr is much less than that of W. We can take advantage of this etch selectivity by using a thin Cr layer under the W absorber as an etch stop layer to eliminate the roughness at the bottom of the features and a thin layer of Cr on top of the W as an etch mask for reducing the sidewall roughness.


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